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| 005 |
20190524075453.0 |
| 008 |
050530s2004 xr ||||| |||||||||||cze d |
| STA |
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|a POSLANO DO SKCR
|b 2011-03-31
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| 040 |
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|a BOD004
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| 080 |
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|a 533.9
|2 MRF
|
| 080 |
|
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|a (043.3)
|2 MRF
|
| 100 |
1 |
|
|a Eliáš, Marek
|7 mub20181016009
|% UČO 16171
|4 dis
|
| 245 |
1 |
0 |
|a Depozice a charakterizace tvrdých CNx/SiOy vrstev vytvářených v induktivně buzeném plazmatu
|h [rukopis] /
|c Marek Eliáš
|
| 260 |
|
|
|c 2004
|
| 300 |
|
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|a 84 l.
|
| 500 |
|
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|a Vedoucí práce: Jan Janča
|
| 502 |
|
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|a Dizertace (Ph.D.)--Masarykova univerzita v Brně, Přírodovědecká fakulta, 2004
|
| 650 |
0 |
7 |
|a fyzika plazmatu
|7 ph120429
|2 czenas
|
| 650 |
0 |
9 |
|a plasma physics
|2 eczenas
|
| 655 |
|
7 |
|a disertace
|7 fd132024
|2 czenas
|
| 700 |
1 |
|
|a Janča, Jan,
|d 1938-
|7 jk01050790
|% UČO 29
|4 ths
|
| 710 |
2 |
|
|a Masarykova univerzita.
|b Katedra fyzikální elektroniky
|7 olak2007365930
|4 dgg
|
| 856 |
4 |
1 |
|z Elektronická verze přístupná pouze pro studenty a pracovníky MU
|u https://is.muni.cz/auth/th/16171/prif_d/
|% s13788
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